YAS Evaporation Source(LNS & PNS & CNS)
LNS & PNS & CNS
구분 |
방식 |
Substrate size |
용도 |
용량(cc) |
2 |
3 |
4 |
5 |
6 |
7 |
8 |
10.5 |
PNS |
Rotational |
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Research/mass production |
10, 40, 150, 400, 800 |
Scanning |
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CNS/SCNS |
Static |
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Research/mass production |
40, 150, 400 |
Rotational |
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CLNS |
Scanning |
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Research/mass production |
1,000 |
LNS |
Scanning |
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Research/mass production |
1,000 3,000 100,000 |
You can check the contents with touch and drag.
- High material using efficiency
- By applying special linear nozzle, it can make the best thin film uniformity
- It can improve doping homogeneity and also, it has small mask shadow phenomenon
- Advantage of the heat transfer to substrate with high TS and Simultaneously hold high material using efficiency
- Proper maintenance of the heat distribution of the evaporation source to prevent clogging of the jet portion
- It can be applied to an equipment that forms a film while moving a substrate or an evaporation source
- Provide organic and inorganic evaporation sources
LT Source |
It is a source for low capacity and small substrate, not for mass production, mainly used for Lab. |
HT Source |
HT Source is used mainly in Inorganic / Metal material |
Al Source |
With sauce specialized in aluminum, It is used in combination with YAS System when using mass production |
- Material using dfficiency is not good, but stable Uniformity can be secured.
- Form even thickness thin film without substrate's rotation
- Efficiency of materials improved by 3~4 times compared with rotary evaporation source using existing Point Source
- thin film evenness is below 2%
- Improve doping homogeneity and improve mask shadow phenomenon, Maximize material utilization during rotation evaporation
- Application possibility up to 4G
(730 × 920 mm)
- Provide organic and inorganic evaporation sources
- Using Nozzle Handling Tech at YAS, U/F & Utilization is possible through Flux control